Method and system for optimizing illumination in an optical phot

Details Method and system for optimizing illumination in an optical phot Method and system for optimizing illumination in an optical phot

1995-06-06

1997-10-21

Teska, Kevin J.

Radiation imagery chemistry: process, composition, or product th

Post imaging processing

Physical developing

430311, 430313, 430316, H01L 2131

Patent

active

056805888

ABSTRACT:
A method and system for finding and setting the illumination in a projection imaging system to achieve optimum imaging. The global optimum illumination is found based on the desired characteristics of the image irradiance distribution as embodied in a target aerial image. The system employs an optimization algorithm that finds the best combination of projected mask images, each such image formed by directing source illumination to selected regions (e.g., pixels) in the entrance pupil (each such region location and size corresponding to a nominal illumination direction and a particular range of angles about the nominal). The optimum illumination is defined as that illumination which produces an aerial image closest to the predefined target aerial image. The system then sets the illuminator to produce the source distribution necessary to achieve this optimal illumination. The set of aerial images created by addressing the available entrance pupil regions with illumination is determined either by numerical calculation or by scanning and recording the individual aerial images produced by the projection system.

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