Method and system for monitoring EUV lithography mask flatness

Details Method and system for monitoring EUV lithography mask flatness Method and system for monitoring EUV lithography mask flatness

2005-09-27

2005-09-27

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for original

C355S072000

Reexamination Certificate

active

06950176

ABSTRACT:
Disclosed are a method of and a system for monitoring extreme ultraviolet (EUV) lithography mask flatness. An EUV mask, which is chucked to a chuck, can be scanned with a capacitance probe that generates elevation data for the EUV mask. From the elevation data, a first flatness profile can be generated. In one embodiment, the EUV mask can be rotated and rescanned.

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Specifications Guide, 4810 Non-Contact Capacitance Gaging Instrument, Copyrighted 2002, ADE Technologies.
Specifications Guide, Microsense II—5810, Non-Contact Capacitance Gaging Module, Copyrighted 2002, ADE Technologies.

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