Method and system for monitoring contamination on a substrate

Details Method and system for monitoring contamination on a substrate Method and system for monitoring contamination on a substrate

2007-03-09

2011-12-27

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S019000, C073S031030, C438S906000

Reexamination Certificate

active

08083862

ABSTRACT:
A method and system for measuring contamination, such as metal contamination, on a substrate. A dry cleaning system is utilized for non-destructive, occasional removal of contamination, such as metal containing contamination, on a substrate, whereby a monitoring system coupled to the exhaust of the dry cleaning system is employed to determine the relative level of contamination on the substrate prior to dry cleaning.

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International Search Report issued in Application No. PCT/US08/055463 mailed Jul. 31, 2008.
Written Opinion issued in Application No. PCT/US08/055463 mailed Jul. 31, 2008.

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