Method and system for measuring overcoat layer thickness on...

Optics: measuring and testing – Dimension – Thickness

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C356S317000, C356S632000, C250S492100, C250S459100

Reexamination Certificate

active

11040376

ABSTRACT:
A method for measuring the thickness of a thin film disk overcoat layer includes radiating x-rays on a thin film disk comprising at least one base layer and an overcoat layer, collecting fluorescence data on electromagnetic radiation fluoresced from the thin film disk, reflecting polarized light from a surface of the thin film disk corresponding to the overcoat layer, collecting ellipsometry data from the polarized light, and estimating the thickness of the overcoat layer using both the fluorescence data and the ellipsometry data. The method may further include providing a statistical model to determine optimal deposition and manufacturing parameters. A system to conduct the described method may include a data analyzer, an ellipsometry measurement device, and an x-ray fluorescence measurement device.

REFERENCES:
patent: 5919560 (1999-07-01), Nishimori
patent: 6031615 (2000-02-01), Meeks et al.
patent: 6040198 (2000-03-01), Komiya et al.
patent: 6091485 (2000-07-01), Li et al.
patent: 6134011 (2000-10-01), Klein et al.
patent: 6259092 (2001-07-01), Brizzolara et al.
patent: 6782337 (2004-08-01), Wack et al.
patent: 61120010 (1986-06-01), None
patent: 61250509 (1986-11-01), None
patent: 1023105 (1989-01-01), None
patent: 7012714 (1995-01-01), None
patent: 10153543 (1998-06-01), None
patent: 2000352506 (2000-12-01), None
patent: WO 03/098397 (2003-11-01), None
-Koo, Yeon Dog. X-Ray lines close to Kll Augen electron energies fro mLron, Cobalt, Nickel, and Cooper monocrystals, 1990. Texas Tech University: Dissertation abstracts international. vol. 51-09, Section B, p. 4419.□□.
Hasche, Klaus. Metrological characterization of nanometer film thickness standards for XRR and ellipsometry applications. Nov. 2003. Recent developments in traceable dimensional measurements II. vol. 5190, pp. 165-172.
“Ultrafast Ellipsometric Mapping of Thin Films”, IBM Technical Disclosure Bulletin, Feb. 1994, pp. 187-188.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and system for measuring overcoat layer thickness on... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for measuring overcoat layer thickness on..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for measuring overcoat layer thickness on... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3915121

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.