Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Quality evaluation
Reexamination Certificate
2007-07-18
2011-12-20
Cosimano, Edward (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Quality evaluation
C438S015000, C700S051000, C700S109000, C700S121000, C702S187000, C702S189000, C716S054000
Reexamination Certificate
active
08082119
ABSTRACT:
A method for controlling mask fabrication is provided, wherein the method uses statistical process control analysis. A manufacturing model is defined. A process run of a mask is performed as defined by the manufacturing model. A fault detection analysis is performed to reduce a bias in the manufacturing model. A fine-tuning signal is generated in response to a result of the fault detection analysis. The process run operation is adjusted according to the fine-tuning signal.
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IBM-TDB: “Exposure Mask Diagnostic and Disposition Targets”, Mar. 1, 1980, vol. 22, No. 10, pp. 4505-4507.
Chang Chen-Yu
Chen Wen-Yao
Hwang Yuh-Fong
Kuo Chiech-Yi
Cosimano Edward
Taiwan Semiconductor Manufacturing Co. Ltd.
Thomas|Kayden
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