Data processing: structural design – modeling – simulation – and em – Simulating nonelectrical device or system
Reexamination Certificate
2011-05-31
2011-05-31
Jones, Hugh (Department: 2128)
Data processing: structural design, modeling, simulation, and em
Simulating nonelectrical device or system
Reexamination Certificate
active
07953582
ABSTRACT:
A method and system for lithography simulation is disclosed. The method and system specify a subject region of a lithography image with a CD marker, specify a threshold intensity over the lithography image, specify a gradient to a threshold value of the threshold intensity, and calculate a sensitivity or ratio of change of an image boundary of the lithography image to lithography process variation.
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Hara Daisuke
Mitsuhashi Takashi
Wu Zhigang
Cadence Design Systems Inc.
Jones Hugh
Vista IP Law Group LLP
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