Method and system for ion beam containment using...

Details Method and system for ion beam containment using... Method and system for ion beam containment using...

2005-05-10

2005-05-10

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S42300F, C250S42300F, C250S492300

Reexamination Certificate

active

06891174

ABSTRACT:
Ion implantation systems and beam containment apparatus therefor are provided in which a photoelectron source and a photon source are provided along a beam path. The photon source, such as a UV lamp, provides photons to a photoemissive material of the photoelectron source to generate photoelectrons for enhanced beam containment in the ion implantation system.

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