Method and system for interferometric height measurement

Optics: measuring and testing – By light interference – Having polarization

Reexamination Certificate

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C356S516000

Reexamination Certificate

active

07397569

ABSTRACT:
A system and method for interferometric height measurement. A first coherent light beam and a second coherent light beam is generated. At least the first coherent light beam is reflected from a first region into a first return beam and the second coherent light beam is reflected from a second region into a second return beam. At least a first reflectivity of the first region is measured. A topography-dependent phase shift of the first return beam and the second return beam is determined with reference to a curve relating the first reflectivity to a material-dependent phase shift. A height based on the topography-dependent phase shift is measured.

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patent: 6580515 (2003-06-01), Li et al.
patent: 6856384 (2005-02-01), Rovira
patent: 7221459 (2007-05-01), Brasen et al.
patent: 410293019 (1998-11-01), None

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