Method and system for improving process control for...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C700S095000, C700S108000, C438S014000

Reexamination Certificate

active

07010382

ABSTRACT:
A method and system are disclosed for configuring manufacturing tools in a semiconductor manufacturing flow. After collecting information with regard to one or more product performance features associated with a processing step performed in a process tool, one or more undesired process tool performance excursion patterns may be determined based on the collected information. On the other hand, operational and processing parameters of the process tool are monitored while conducting the processing step. Non-conformance faults of the monitored operational and processing conditions are detected and classified. A correlation between the classified non-conformance faults with the determined excursion patterns is made for adjusting one or more processing parameters of the processing tool.

REFERENCES:
patent: 6460002 (2002-10-01), Bone et al.
patent: 6556884 (2003-04-01), Miller et al.
patent: 6560503 (2003-05-01), Toprac et al.
patent: 6597447 (2003-07-01), Stirton et al.
patent: 6647309 (2003-11-01), Bone
patent: 6823231 (2004-11-01), Bode et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and system for improving process control for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for improving process control for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for improving process control for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3537258

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.