Method and system for improved defect sensitivity for...

Details Method and system for improved defect sensitivity for... Method and system for improved defect sensitivity for...

2007-05-22

2007-05-22

Pham, Hoa Q. (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

C356S237400

Reexamination Certificate

active

11251129

ABSTRACT:
Techniques for inspecting a substrate with improved defect sensitivity are disclosed. High sensitivity is achieved by reducing the noise due by using multiple laser beams for illumination, in which each beam is nearly collimated and illuminates uniformly a field of view. The images generated respectively by the laser beams are added incoherently by means of delivering the illumination beams incoherently in either time domain or space domain. According to one embodiment, all the illumination beams may not be interact with each other coherently so that the images generated by each laser beams can be summed together incoherently to average out possible excessive noise.

REFERENCES:
patent: 6411377 (2002-06-01), Noguchi et al.
patent: 2005/0110988 (2005-05-01), Nishiyama et al.

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