Method and system for high speed photolithography

Photocopying – Projection printing and copying cameras – With focusing or projection screen

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Details

355 18, 359 36, 364488, 364489, G03B 2752, G03B 2732, G03C 500

Patent

active

H00015253

ABSTRACT:
A method and system for modification of a pattern on a semiconductor subste, comprising the application of an electrical current through a liquid medium having a series of individual pixels controlled by a computer, thereby causing the clear liquid to change to opaque in selected areas.

REFERENCES:
patent: 4653860 (1987-03-01), Hendrix
patent: 5045419 (1991-09-01), Okumura

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