Method and system for generating a mask layout of an optical int

Details Method and system for generating a mask layout of an optical int Method and system for generating a mask layout of an optical int

1996-09-13

1999-06-22

Teska, Kevin J.

Boots, shoes, and leggings

364490, G06F 1700, G06F 1750

Patent

active

059148896

ABSTRACT:
A computer system and method provide a CAD tool by which a mask for an application specific optical integrated circuit, chip, or wafer may be generated both easily and quickly. The method involves the step of receiving the design for an optical circuit with the circuit design including at least one optical component. Each optical component in the optical circuit is defined by one or more geometric shapes, such as a trapezoid, rectangle, or an arcuate polygon. The method further includes the step of retrieving parameters which define the manufacturing standard by which the optical circuit will be fabricated as well as parameters which define the optical components in the optical circuit. Based on the parameters and the geometric shapes, a plot is generated which forms a mask layout for the optical circuit. The mask layout can then be viewed by a graphical editor whereby a designer can receive visual confirmation that the mask layout accurately portrays the desired optical circuit, chip, or wafer.

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