Method and system for forming a variable thickness seed layer

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor

Reexamination Certificate

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C117S087000, C117S088000, C117S089000, C117S090000, C118S7230AN, C118S719000, C427S248100, C427S532000

Reexamination Certificate

active

07351285

ABSTRACT:
A method and system for forming a variable thickness seed layer on a substrate for a subsequent metal electrochemical plating process, where the seed layer thickness profile improves uniformity of the electroplated metal layer compared to when using a constant thickness seed layer. The method includes providing a substrate in a process chamber containing a showerhead, with the center of the substrate generally aligned with an inner gas delivery zone of the showerhead and the edge of the substrate generally aligned with an outer gas delivery zone of the showerhead. The method further includes depositing a seed layer on the substrate by exposing the substrate to a first gas containing a metal-containing precursor flowed through the inner gas delivery zone, and exposing the substrate to a second gas flowed through the outer gas delivery zone, whereby the seed layer is deposited with a thickness at the edge of the substrate that is less than the thickness at the center of the substrate.

REFERENCES:
patent: 5532190 (1996-07-01), Goodyear et al.
patent: 6303809 (2001-10-01), Chi et al.
patent: 6319832 (2001-11-01), Uhlenbrock et al.
patent: 6420583 (2002-07-01), Lienhard et al.
patent: 6428850 (2002-08-01), Shinriki et al.
patent: 6440495 (2002-08-01), Wade et al.
patent: 6458415 (2002-10-01), Meguro et al.
patent: 6478872 (2002-11-01), Chae et al.
patent: 6605735 (2003-08-01), Kawano et al.
patent: 6624091 (2003-09-01), Yuan
patent: 6627539 (2003-09-01), Zhao et al.
patent: 6660245 (2003-12-01), Gaynor et al.
patent: 6713373 (2004-03-01), Omstead
patent: 6756235 (2004-06-01), Liu et al.
patent: 6866882 (2005-03-01), Shinriki et al.
patent: 6989321 (2006-01-01), Yamasaki et al.
patent: 7279421 (2007-10-01), Suzuki
patent: 2002/0163028 (2002-11-01), Yuan
patent: 2003/0019858 (2003-01-01), Dornfest et al.
patent: 2003/0079686 (2003-05-01), Chen et al.
patent: 2003/0129306 (2003-07-01), Wade et al.
patent: 2004/0013577 (2004-01-01), Ganguli et al.
patent: 2004/0050325 (2004-03-01), Samoilov et al.
patent: 2004/0105934 (2004-06-01), Chang et al.
patent: 2004/0241321 (2004-12-01), Ganguli et al.
patent: 2005/0070100 (2005-03-01), Yamasaki et al.
patent: 2005/0081882 (2005-04-01), Greer et al.
patent: 2005/0110142 (2005-05-01), Lane et al.
patent: 2005/0186341 (2005-08-01), Hendrix et al.
patent: 2005/0221000 (2005-10-01), Ikeda et al.
patent: 2006/0110530 (2006-05-01), Suzuki et al.
patent: 2006/0110918 (2006-05-01), Suzuki
patent: 2006/0115589 (2006-06-01), Vukovic
patent: 2006/0115593 (2006-06-01), Suzuki et al.
patent: 2006/0219160 (2006-10-01), Matsuda
patent: 2006/0219177 (2006-10-01), Brcka
patent: 2006/0222768 (2006-10-01), Faguet
patent: 2006/0222769 (2006-10-01), Brcka
patent: 2007/0113789 (2007-05-01), Brcka
patent: 2007/0218200 (2007-09-01), Suzuki et al.
patent: WO 0208487 (2002-01-01), None
European Patent Office; International Search Report and Written Opinion of corresponding PCT application PCT/US2006/008112; dated Sep. 7, 2006, 11 pgs.

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