Cleaning and liquid contact with solids – Apparatus – Automatic controls
Patent
1988-12-12
1990-02-13
Stinson, Frankie L.
Cleaning and liquid contact with solids
Apparatus
Automatic controls
134 95, 134 99, 134186, B08B 302
Patent
active
048997676
ABSTRACT:
A system for the fluid treatment of semiconductor wafers includes a treatment vessel having opposed first and second ports, and means for holding wafers in a flow path therebetween. A flow segment comprising in sequence, a first vent, a first valve, an inlet, a second valve and a second vent extends between the first and the second port so as to constitute, together with the vessel, a closed fluid loop.
A fluid delivery system for the delivery of a sequence of high purity treatment fluids to a treatment vessel includes a measuring tank having opposed ports and configured for plug flow between the ports, and a metering pump having its inlet connected to a said port for withdrawing metered amounts of fluid from the tank. A plurality of reservoirs of treatment fluid are each connected via a respective associated valve to one of the said ports. The tank is maintained hydraulically full, so that actuating the pump to withdraw a metered volume of fluid from the tank, and opening a valve associated with a selected treatment fluid draws the metered volume of the selected treatment fluid into the tank. Passive or non-mechanical means is provided for delivering the contents of the tank to a treatment vessel.
A mixing tank may be provided, between the measuring tank and the treatment vessel. Mixing may be accomplished by bubbling a gas through the fluid held in the mixing tank.
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McConnell Christopher F.
Walter Alan E.
CFM Technologies, Inc.
Stinson Frankie L.
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