Method and system for evaluating an object that has a...

Details Method and system for evaluating an object that has a... Method and system for evaluating an object that has a...

2011-06-28

2011-06-28

Bui, Bryan (Department: 2857)

Data processing: measuring, calibrating, or testing

Measurement system

Dimensional determination

C356S388000, C355S053000

Reexamination Certificate

active

07970577

ABSTRACT:
A method for evaluating placement errors within a lithographic mask, the method includes: providing or receiving a reference result that represents a distance between a reference pair of points of a reference element; measuring, for each pair of points out of multiple pairs of points that are associated with multiple spaced apart elements of the lithographic mask, the distance between the pair of points to provide multiple measurement results; wherein differences between a measurement result and the reference result are indicative of relative placement errors; and determining relative placement errors in response to relationships between the reference result and each of the measurement results.

REFERENCES:
patent: 6924896 (2005-08-01), Hill
patent: 7262831 (2007-08-01), Akhssay et al.

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