Method and system for electron density measurement

Details Method and system for electron density measurement Method and system for electron density measurement

2007-02-13

2007-02-13

Tsai, Carol S. W. (Department: 2857)

Data processing: measuring, calibrating, or testing

Measurement system

Performance or efficiency evaluation

C702S188000

Reexamination Certificate

active

10521118

ABSTRACT:
The present invention provides a diagnostic system for plasma processing, wherein the diagnostic system comprises a multi-modal resonator, a power source, a detector, and a controller. The controller is coupled to the power source and the detector and it is configured to provide a man-machine interface for performing several monitoring and controlling functions associated with the diagnostic system including: a Gunn diode voltage monitor, a Gunn diode current monitor, a varactor diode voltage monitor, a detector voltage monitor, a varactor voltage control, a varactor voltage sweep control, a resonance lock-on control, a graphical user control, and an electron density monitor. The diagnostic system can further provide a remote controller coupled to the controller and configured to provide a remote man-machine interface. The remote man-machine interface. The remote man-machine interface can provide a graphical user interface in order to permit remote control of the diagnostic system by an operator. In addition, the present invention provides several methods of controlling the diagnostic system in order to perform both monitor and control functions.

REFERENCES:
patent: 5936481 (1999-08-01), Fujii
patent: 6133795 (2000-10-01), Williams
patent: 6766279 (2004-07-01), Linley et al.
patent: 2004/0267547 (2004-12-01), Strang
patent: 03263828 (1991-11-01), None
patent: WO 200106402 (2001-01-01), None
patent: WO 200106544 (2001-01-01), None
patent: WO 200137306 (2001-05-01), None

Affiliated with

Also associated with

Rating

Method and system for electron density measurement does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for electron density measurement, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for electron density measurement will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3816345