Method and system for efficiently verifying optical...

Details Method and system for efficiently verifying optical... Method and system for efficiently verifying optical...

2007-12-04

2007-12-04

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S005000, C716S030000, C716S030000

Reexamination Certificate

active

11075321

ABSTRACT:
A method of verifying optical proximity correction includes the steps of generating first mask pattern data from design data under first condition, generating first corrected pattern data by applying optical proximity correction to the first mask pattern data, generating second mask pattern data from the design data under second condition, generating second corrected pattern data by applying optical proximity correction to the second mask pattern data, and comparing the first corrected pattern data and the second corrected pattern data to check whether the first corrected pattern data and the second corrected pattern data match.

REFERENCES:
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