Method and system for dynamic modeling and recipe...

Details Method and system for dynamic modeling and recipe... Method and system for dynamic modeling and recipe...

2006-12-26

2006-12-26

Picard, Leo (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S097000, C716S030000, C716S030000

Reexamination Certificate

active

07155301

ABSTRACT:
A method and system are disclosed for creating dynamic models of etch processes in semiconductor manufacturing. In one embodiment, a method comprises modeling an etch process used in semiconductor manufacturing to generate a dynamic process model. The dynamic process model is used to determine input values that result in a desired output value. A process recipe is optimized for the etch process with the input values.

REFERENCES:
patent: 6133132 (2000-10-01), Toprac et al.
patent: 2005/0098535 (2005-05-01), Lansford et al.
Baker et al. “In-situ prediction of RIE time to completion using neural networks” IEEE Electronincs Manufacturing Technology Symposium 1994, pp. 319-324, Sep. 1994.

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