Method and system for developing a photo-resist material used as

Details Method and system for developing a photo-resist material used as Method and system for developing a photo-resist material used as

1982-07-07

1984-09-04

Mathews, A. A.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

354317, 354325, 134 57R, 134151, 430 30, G03D 306

Patent

active

044694245

ABSTRACT:
Disclosed is a method and a system for developing a photo-resist material of an optical recording medium on which digital information is recorded in the form of a series of pits whose position and length represent the digital information. In order to precisely control the size of the pits formed during the developing process, and to reduce the deviation from one recording medium to another, a monitoring beam is applied on the recording medium during the developing process. A diffraction beam of the monitoring energy beam passes through the pits, and is received by a sensor means which monitors the intensity of the diffraction beam and which produces a signal for controlling the supply of developing solution on the recording medium.

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patent: 4119989 (1978-10-01), Carvalko et al.
patent: 4128325 (1978-12-01), Melander et al.
patent: 4136940 (1979-01-01), Lin

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