Method and system for determining an optimized artificial...

Details Method and system for determining an optimized artificial... Method and system for determining an optimized artificial...

2011-04-19

2011-04-19

Connolly, Patrick J (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

C343S909000

Reexamination Certificate

active

07929147

ABSTRACT:
A method and system for determining an optimized artificial impedance surface is disclosed. An artificial impedance pattern is calculated on an impedance surface using an optical holographic technique given an assumed surface wave profile and a desired far field radiation pattern. Then, an actual surface wave profile produced on the impedance surface from the artificial impedance pattern, and an actual far field radiation pattern produced by the actual surface wave profile are calculated. An optimized artificial impedance pattern is then calculated by iteratively re-calculating the artificial impedance pattern from the actual surface wave profile and the desired far field radiation pattern. An artificial impedance surface is determined by mapping the optimized artificial impedance pattern onto a representation of a physical surface.

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