Method and system for determining a defect during sample...

Details Method and system for determining a defect during sample... Method and system for determining a defect during sample...

2008-12-23

2011-11-08

Connolly, Patrick J (Department: 2877)

Image analysis

Applications

Manufacturing or product inspection

C382S106000, C382S151000

Reexamination Certificate

active

08055059

ABSTRACT:
A method for determining a defect during sample inspection involving charged particle beam imaging transforms a target charged particle microscopic image and its corresponding reference charged particle microscopic images each into a plurality of feature images, and then compares the feature images against each other. Each feature image captures and stresses a specific feature which is common to both the target and reference images. The feature images produced by the same operator are corresponding to each other. A distance between corresponding feature images is evaluated. Comparison between the target and reference images is made based on the evaluated distances to determine the presence of a defect within the target charged particle microscopic image.

REFERENCES:
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patent: 6952492 (2005-10-01), Tanaka et al.
patent: 7116816 (2006-10-01), Tanaka et al.
patent: 7116817 (2006-10-01), Tanaka et al.
patent: 2002/0056808 (2002-05-01), Tsuneta et al.

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