Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2011-06-28
2011-06-28
Chawan, Sheela C (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S205000, C382S274000, C358S003010
Reexamination Certificate
active
07970201
ABSTRACT:
A system, method and computer program product for defect detection, the method includes: (i) retrieving a second pixel of a second image that corresponds to a tested pixel of a first image of the object; wherein the first and second images were obtained using different acquisition methods; (ii) searching a third pixel of the second image such that a neighborhood of the second pixel is similar to a neighborhood of the third pixel; (iii) retrieving a fourth pixel of the first image that corresponds to the third pixel; and (iv) comparing between the tested pixel and the fourth pixel.
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patent: 7133548 (2006-11-01), Kenan et al.
patent: 7274825 (2007-09-01), Lee et al.
patent: 7528943 (2009-05-01), Brown et al.
patent: 7570800 (2009-08-01), Lin et al.
patent: 7711177 (2010-05-01), Leslie et al.
Ben-Yishay Michael
Gvirtzer Ophir
Applied Materials Israel, Ltd.
Chawan Sheela C
SNR Denton US LLP
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