Method and system for controlling the relative size of images fo

Radiation imagery chemistry: process – composition – or product th – Plural exposure steps

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430396, 430311, G03F 720, G03F 7207

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active

059521600

ABSTRACT:
A method of exposing a radiation-sensitive medium through a mask and using an imaging system having a given depth of focus to control for pattern dependent distortion. The steps comprise: providing the radiation-sensitive medium within the depth of focus of the imaging system; providing radiation to the radiation-sensitive medium through the mask; providing the radiation-sensitive medium fully outside the depth of focus of the imaging system; and providing radiation to the radiation-sensitive medium through the mask. Corrections are automatically made by providing the radiation-sensitive medium fully outside the depth of focus of the imaging system, since in that regime the mask operates as a gray-scale mask, with the amount of light passing through any region of the mask dependent on the transmission of the masking pattern in that region.

REFERENCES:
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patent: 5137349 (1992-08-01), Taniguchi et al.
patent: 5255050 (1993-10-01), Kitagawa
patent: 5476736 (1995-12-01), Tanabe

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