Method and system for controlling radical distribution

Details Method and system for controlling radical distribution Method and system for controlling radical distribution

2010-04-06

2011-10-18

Lund, Jeffrie R (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With etchant gas supply or exhaust structure located outside...

C118S715000, C216S067000, C427S569000, C438S710000, C438S771000, C438S776000, C134S001100

Reexamination Certificate

active

08038834

ABSTRACT:
A plasma processing system includes a processing chamber, a substrate holder configured to hold a substrate for plasma processing, and a gas injection assembly. The gas injection assembly includes a first evacuation port located substantially in a center of the gas injection assembly and configured to evacuate gases from a central region of the substrate, and a gas injection system configured to inject gases in the process chamber. The plasma processing system also includes a second evacuation port configured to evacuate gases from a peripheral region surrounding the central region of the substrate.

REFERENCES:
patent: 5962085 (1999-10-01), Hayashi et al.
patent: 6334983 (2002-01-01), Okayama et al.
patent: 6403491 (2002-06-01), Liu et al.
patent: 6432259 (2002-08-01), Noorbakhsh et al.
patent: 6537418 (2003-03-01), Muller et al.
patent: 6733620 (2004-05-01), Sugiyama et al.
patent: 6821910 (2004-11-01), Adomaitis et al.
patent: 7273526 (2007-09-01), Shinriki et al.
patent: 7718030 (2010-05-01), Funk et al.
patent: 2004/0216668 (2004-11-01), Lindfors et al.
patent: 2005/0103265 (2005-05-01), Gianoulakis et al.
patent: 2005/0109460 (2005-05-01), DeDontney et al.
patent: 2005/0208217 (2005-09-01), Shinriki et al.
patent: 2005/0229848 (2005-10-01), Shinriki et al.
patent: 2005/0255257 (2005-11-01), Choi et al.
patent: 2006/0054280 (2006-03-01), Jang
patent: 2006/0234514 (2006-10-01), Gianoulakis et al.
patent: 2007/0026540 (2007-02-01), Nooten et al.
patent: 2007/0068625 (2007-03-01), Funk et al.
patent: 2010/0193471 (2010-08-01), Funk et al.
patent: 2000-188281 (2000-07-01), None

Affiliated with

Also associated with

Rating

Method and system for controlling radical distribution does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for controlling radical distribution, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for controlling radical distribution will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4257832