Method and system for controlling focused ion beam alignment...

Details Method and system for controlling focused ion beam alignment... Method and system for controlling focused ion beam alignment...

2006-09-12

2006-09-12

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, C250S492300

Reexamination Certificate

active

07105843

ABSTRACT:
A method for calibrating operational parameters of a charged particle beam device comprises generating a plurality of distinct spots on a specimen, each spot being generated in response to adjusted operational parameters of the charged particle beam device, and registering said respective operational parameters.

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patent: 2004/0066454 (2004-04-01), Otani et al.
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