Method and system for coating and developing

Details Method and system for coating and developing Method and system for coating and developing

2005-04-26

2005-04-26

Hassanzadeh, Parviz (Department: 1763)

Coating apparatus

Gas or vapor deposition

Multizone chamber

C156S345310, C156S345320, C156S345330, C156S345340, C118S724000, C118S725000, C204S298070, C204S298330

Reexamination Certificate

active

06884298

ABSTRACT:
A coating and developing treatment system for performing coating and developing treatment. A coating treatment unit is configured to form a resist film on a substrate. A developing treatment unit is configured to develop the substrate. A heating/cooling unit includes a heat plate configured to continuously heat and a cooling plate configured to continuously cool in one casing the substrate on which the resist film has been formed by the coating treatment unit. A gas nozzle is configured to supply a treatment gas to the resist film formed on the substrate to form a protective film on a surface of the resist film. The gas nozzle is disposed on a cooling plate side in the heating/cooling unit. The gas nozzle is configured to move to a position above the substrate on the cooling plate during cooling at the cooling plate, to supply the treatment gas.

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