Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2005-01-31
2010-10-26
Markoff, Alexander (Department: 1711)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C134S001000, C134S026000, C134S030000, C134S001200
Reexamination Certificate
active
07819979
ABSTRACT:
A method and system for providing a magnetic structure that includes at least one magnetic material is disclosed. The method and system include defining the magnetic structure. The magnetic structure also includes a top layer that is insensitive to an istroropic carbonyl reactive ion etch. The defining of the magnetic structure results in at least one artifact. The method and system further includes cleaning the at least one artifact using at least one isotropic carbonyl reactive ion etch.
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Chen Benjamin
Chen Yingjian
Hiner Hugh C.
Li Yun-Fei
Zhang Wei
Markoff Alexander
Western Digital (Fremont) , LLC
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