Method and system for cleaning an aperture in a particle study d

Details Method and system for cleaning an aperture in a particle study d Method and system for cleaning an aperture in a particle study d

1974-11-04

1976-06-15

Corbin, John K.

Electricity: measuring and testing

Determining nonelectric properties by measuring electric...

Erosion

134 1, B08B 310, G01N 2702

Patent

active

039639843

ABSTRACT:
In both the method and system for clearing the debris from the aperture of a particle study device combinations of pulses of predetermined, waveform amplitude and frequency are developed and coupled through the conductive fluid passing through the particle study device aperture. The pulses cause the fluid in the aperture to vaporize and form a gas. The gas explodes away any debris clogging the aperture as it escapes from the aperture.

REFERENCES:
patent: 3232085 (1966-02-01), Inoue
patent: 3259891 (1966-07-01), Coulter et al.
patent: 3420758 (1969-01-01), Scheer
patent: 3429743 (1969-02-01), Branson
patent: 3512384 (1970-05-01), Inoue

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