Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-09-06
2005-09-06
Mehta, Bhavesh M. (Department: 2625)
Image analysis
Applications
Manufacturing or product inspection
C382S190000, C382S273000, C348S087000
Reexamination Certificate
active
06941006
ABSTRACT:
A method for calibrating the scan amplitude of an electron beam lithography instrument by determining the position of a feature within the scan. The method is effective at the operating frequency of the scan and using a limited bandwidth video signal including the steps of determining the reference feature to be an edge over which the video signal rises abruptly from a background level to a white level. The method turns the beam on only over a short region of the scan and represents the degree of overlap between the beam on portion of the scan and the white part of the feature as the total video signal accumulated in that scan.
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IBM Techinical Disclosure Bulletin NN82112718, Nov. 1982, US vol. No. 25.
Penberth Michael J.
Plows Graham S.
Woolfe Adam
Chawan Sheela
DuPont Photomasks, Inc.
Mehta Bhavesh M.
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