Method and system for automatically deriving stippling...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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Details

C700S138000, C112S475190

Reexamination Certificate

active

06968255

ABSTRACT:
The invention pertains to a method of applying a stippling stitch design to an area defining an asymmetrical polygon in a coordinate planar display format, involving: defining a pathway, which may be based on a fractal design, within a geometrically symmetrical boundary, the pathway comprising a single non-intersecting line; conforming the pathway to an asymmetrical polygon area substantially disposed within the geometrically symmetrical boundary; deriving a plurality of coordinate points representative of the pathway; and passing the points to a data storage medium in a pre-determined embroidery data format.

REFERENCES:
patent: 5430658 (1995-07-01), Divinsky et al.
patent: 6807456 (2004-10-01), Costin et al.

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