Method and system for assessing a measurement procedure and meas

Details Method and system for assessing a measurement procedure and meas Method and system for assessing a measurement procedure and meas

1997-10-17

1999-08-24

Grant, William

Boots, shoes, and leggings

364578, 364490, G06F 1500, G06G 748

Patent

active

059432373

ABSTRACT:
In the testing of certain discrete devices, such as integrated circuits, it has been found that variations in measurements are often caused by error terms from the measurement equipment and process. The invention provides a statistical process control (SPC) method and apparatus that determines the errors introduced by the measurement equipment and process. Statistical processes are provided to compensate for these errors and improve the accuracy of the testing process. The measurement errors are based upon repeated independent measurements of select parameters of each unit tested.

REFERENCES:
patent: 5197011 (1993-03-01), Biemans et al.
patent: 5399531 (1995-03-01), Wu
patent: 5408405 (1995-04-01), Mozumder et al.
patent: 5646870 (1997-07-01), Krivokapic et al.
patent: 5655110 (1997-08-01), Krivokapic et al.
patent: 5761064 (1998-06-01), La et al.
"Successful Implementation of SPC in Semiconductor Final Test", by Sarkis Ourfalian; Analog Devices, Inc., Wilmington, MA; Int'l Test Conf. 1992; pp. 275-282.
"Statistical Process Control, the CQM Approach"; by Does, et al; Jan. 1992; pp. 1-44.

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