Radiation imagery chemistry: process – composition – or product th – Effecting frontal radiation modification during exposure,... – Involving motion during exposure – e.g. – dodging – etc.
Patent
1991-09-17
1994-05-31
Simmons, David A.
Radiation imagery chemistry: process, composition, or product th
Effecting frontal radiation modification during exposure,...
Involving motion during exposure, e.g., dodging, etc.
427595, 118620, 118301, 118505, 1562755, G03C 504, B32B 3100, B05C 908
Patent
active
053168976
ABSTRACT:
A method and apparatus for exposing a substrate of relatively large surface area to radiation according to a predetermined pattern recorded on a mask, particularly useful in applying a painted border to an automobile windshield, includes the steps of progressively recording the predetermined pattern on a mask in the form of a continuous strip, and moving the radiation source to progressively scan the surface of the substrate with radiation, while at the same time moving the continuous strip mask relative to the radiation source, such that portions of the pattern on the continuous strip mask progressively become aligned with their corresponding portions of the substrate as the substrate is progressively scanned by the radiation source.
REFERENCES:
patent: 3984180 (1976-10-01), Hadzimahalis
patent: 4591238 (1986-05-01), Kitaoka et al.
patent: 4645318 (1987-02-01), Trumball
patent: 4752352 (1988-06-01), Feygin
patent: 4844947 (1989-07-01), Kasner et al.
patent: 4940641 (1990-07-01), Pavone et al.
patent: 4977668 (1990-12-01), McKenzie, Jr.
patent: 5089184 (1992-02-01), Hirano et al.
patent: 5151725 (1992-09-01), Liljegren et al.
Barish Benjamin J.
Barry Chester T.
Simmons David A.
Tamglass Oy
LandOfFree
Method and system for applying a marking to a substrate, particu does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and system for applying a marking to a substrate, particu, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for applying a marking to a substrate, particu will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1627262