Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-06-13
2006-06-13
Ahmed, Samir (Department: 2623)
Image analysis
Applications
Manufacturing or product inspection
C356S237300
Reexamination Certificate
active
07062081
ABSTRACT:
In order to allow critical flaws in an inspected item to be determined early during a production process, the present invention includes the following steps: a step of detecting defects in a production process for the inspected item and storing defect positions; a step of collecting detailed defect information and storing the detailed information in association with defect positions; a step of storing positions at which flaws were generated based on a final inspection of the inspected item; a step of comparing defect positions with positions at which flaws were generated; and a step of classifying and displaying detailed information based on the comparison results.
REFERENCES:
patent: 5761337 (1998-06-01), Nishimura et al.
patent: 5801965 (1998-09-01), Takagi et al.
patent: 5841893 (1998-11-01), Ishikawa et al.
patent: 5966459 (1999-10-01), Chen et al.
patent: 6496596 (2002-12-01), Zika et al.
patent: 6535776 (2003-03-01), Tobin et al.
patent: 6597381 (2003-07-01), Eskridge et al.
patent: 08021803 (1996-01-01), None
patent: 11176899 (1999-07-01), None
Hamamura Yuichi
Ishimaru Ichirou
Isogai Seiji
Ozawa Yasuhiko
Shimoda Atsushi
Ahmed Samir
Antonelli, Terry Stout and Kraus, LLP.
LandOfFree
Method and system for analyzing circuit pattern defects does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and system for analyzing circuit pattern defects, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for analyzing circuit pattern defects will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3649269