Method and system for analyzing circuit pattern defects

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

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Details

C356S237300

Reexamination Certificate

active

07062081

ABSTRACT:
In order to allow critical flaws in an inspected item to be determined early during a production process, the present invention includes the following steps: a step of detecting defects in a production process for the inspected item and storing defect positions; a step of collecting detailed defect information and storing the detailed information in association with defect positions; a step of storing positions at which flaws were generated based on a final inspection of the inspected item; a step of comparing defect positions with positions at which flaws were generated; and a step of classifying and displaying detailed information based on the comparison results.

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