Method and system for active purging of pellicle volumes

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Reexamination Certificate

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C355S053000

Reexamination Certificate

active

07619718

ABSTRACT:
The present invention provides methods and systems for fast purging of pellicle volumes. A purge device has a base which is enclosed in a controlled environment filled with purge gas. The base has a cavity formed on a surface therein. The cavity receives a reticle-pellicle assembly including a pellicle surface and an enclosed pellicle volume. A first region within the cavity can be formed to hold purging gas at a high pressure. A gap region is formed below the pellicle within the cavity. A displacement force on the pellicle due to a pressure difference between purging gas in the enclosed volume and purging gas in the gap region is kept within a tolerance range of the pellicle. According to further embodiments, a purge device is provided that includes a flow barrier (e.g., non-contacting and/or contacting barriers). A pressure balancing plate and/or flow resistant plates are provided in a purge device.

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Translation of Office Action and Office Action for Patent Application No. 2004-295412 mailed Mar. 24, 2008, 4 pgs.
English Translation of Japanese Patent Publication No. JP 2003-209042 A published Jul. 25, 2003, 20 pgs.
English Translation of Japanese Patent Publication No. JP 2003-228163 A published Aug. 15, 2003, 24 pgs.
English abstract of Japanese Patent Publication No. JP 2003-167328 A, 1 page, dated: Jun. 13, 2003.
English abstract of Japanese Patent Publication No. JP 2001-345264 A, 1 page, dated: Dec. 14, 2001.

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