Method and system for a maskless lithography rasterization...

Details Method and system for a maskless lithography rasterization... Method and system for a maskless lithography rasterization...

2006-01-27

2008-12-23

Wu, Jingge (Department: 2624)

Image analysis

Applications

Manufacturing or product inspection

C349S004000, C349S030000, C378S034000, C430S396000, C250S550000, C359S011000, C359S237000, C355S067000, C355S071000

Reexamination Certificate

active

07469058

ABSTRACT:
Provided are a method and system for determining states of spatial light modulator (SLM) pixels in a lithography system configured to print a desired pattern. The method includes determining diffraction orders associated with an ideal mask of a pattern to be printed by the lithography system, and then configuring the states of the SLM pixels to match all the diffraction orders that are relevant in the image formation.

REFERENCES:
patent: 5296891 (1994-03-01), Vogt et al.
patent: 6057639 (2000-05-01), May et al.
patent: 6177980 (2001-01-01), Johnson
patent: 6238852 (2001-05-01), Klosner
patent: 6247037 (2001-06-01), O'Callaghan
patent: 6312134 (2001-11-01), Jain et al.
patent: 6399261 (2002-06-01), Sandstrom
patent: 6424388 (2002-07-01), Colgan et al.
patent: 6428940 (2002-08-01), Sandstrom
patent: 6498685 (2002-12-01), Johnson
patent: 6624880 (2003-09-01), Sandstrom et al..
patent: 6707534 (2004-03-01), Bjorklund et al.
patent: 6717650 (2004-04-01), Jain
patent: 6764796 (2004-07-01), Fries
patent: 6819469 (2004-11-01), Koba
patent: 6833854 (2004-12-01), Sandstrom
patent: 6841787 (2005-01-01), Almogy
patent: 6876440 (2005-04-01), Bleeker et al.
patent: 6956692 (2005-10-01), Duerr et al.
patent: 6963434 (2005-11-01), Latypov
patent: 6992754 (2006-01-01), Bleeker et al.
patent: 7012674 (2006-03-01), Sewell
patent: 7061226 (2006-06-01), Durr
patent: 7061591 (2006-06-01), Bleeker et al.
patent: 7063920 (2006-06-01), Baba-Ali
patent: 7094506 (2006-08-01), Van Buel
patent: 7102733 (2006-09-01), Latypov et al.
patent: 7106490 (2006-09-01), Sandstrom
patent: 7110082 (2006-09-01), Smirnov et al.
patent: 7153616 (2006-12-01), Mason
patent: 7170669 (2007-01-01), Jain et al.
patent: 7215409 (2007-05-01), Sandstrom
patent: 7369291 (2008-05-01), Karlin
patent: 2002/0021426 (2002-02-01), Mei et al.
patent: 2003/0206281 (2003-11-01), Jain
patent: 2003/0210383 (2003-11-01), Bjorklund et al.
patent: 2004/0135965 (2004-07-01), Holmes
patent: 2004/0239908 (2004-12-01), Bleeker et al.
patent: 2005/0007677 (2005-01-01), Coston et al.
patent: 2005/0024613 (2005-02-01), Bleeker
patent: 2005/0068467 (2005-03-01), Bleeker et al.
patent: 2005/0211919 (2005-09-01), Galburt et al.
patent: 2004-363598 (2004-12-01), None
patent: WO 98/04950 (1998-02-01), None
patent: WO 2006/083685 (2006-08-01), None
Sandstrom, Tor, Arno Bleeker, Jason D. Hintersteiner, and Kars Troost. “OML: Optical Maskless Lithography for Economic Design Prototyping and Small-Volume Production”. Proceedings of SPIE, vol. 5377. Optical Microlithography XVII: May 2004. pp. 777-787.
Azat Latypov, Ronald Albright, Nabila BabaAli, Wenceslao A. Cebuhar, Jason D. Hintersteiner, and Elizabeth Stone; “Optical Rasterization Algorithms for Contrast Devices Utilizing Different Physical Modulation Principles in Optical Maskless Lithography,” Emerging Lithographic Technologies IX, edited by R. Scott Mackay, Proceedings of SPIE vol. 5751, pp. 1038-1049, (SPIE, Bellingham, WA, 2005).
Search Report, dated Feb. 26, 2007, for PCT Patent Application No. PCT/US06/02823, 9 pgs.
Shroff, et al., “Image Optimization for Maskless Lithography”,Emerging Lithographic Technologies VIII, Proceedings of SPIE vol. 5374, 2004, pp. 637-647.

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