Method and system employing optical emission spectroscopy for mo

Details Method and system employing optical emission spectroscopy for mo Method and system employing optical emission spectroscopy for mo

1992-08-25

1994-09-13

Smith, Jerry

Boots, shoes, and leggings

364498, 364550, 20419233, 20429832, G06F 1546, C23C 1400

Patent

active

053474600

ABSTRACT:
Automated, closed loop method and system for monitor and control of semiconductor fabrication processing are described. Optical emissions spectrometer (OES) data readings from a fabrication plasma chamber are statistically analyzed and a novel pattern model (based on Markov random fields) is used in combination with a selective stochastic relaxation technique to identify gaseous species within the chamber from the OES readings. Wavelength and intensity information is also employed to accurately estimate relative concentration levels of identified gases within the chamber. The unique statistical analysis approach described allows real-time monitor and control of physical processing within the fabrication chamber. Several practical algorithms are set forth, including techniques for OES peak identification, peak sharpening, gas identification, and physical processing control.

REFERENCES:
patent: 4365303 (1982-12-01), Hannah et al.
patent: 4493745 (1985-01-01), Chen et al.
patent: 4676868 (1987-06-01), Riley et al.
patent: 5014217 (1991-05-01), Savage
patent: 5059552 (1991-10-01), Harder et al.
J. Besag, "Spacial Interaction and the Statistical Analysis of Lattice Systems," J. Royal Statistical Soc., 36, pp. 192-236, 1974.
A. P. Dempster, N. M. Laird and D. B. Rubin, "Maximum Likelihood from Incomplete Data via the EM Algorithm," J. Royal Statistical Soc., 39, pp. 1-38, 1976.
S. Geman and D. Geman, "Stochastic Relaxation, Gibbs Distributions, and the Bayesian Restoration of Images," IEEE Transactions on Pattern Analysis and Machine Intelligence, vol. PAMI-6, No. 6, pp. 721-741, 1984.
U. Grenander, "Tutorial in Pattern Theory," Division of Applied Mathematics, Brown University, Providence, R.I., Chapter 4, pp. 44-99, 1983.
U. Grenander, "Advances in Pattern Theory, The Rietz Lecture 1985," Division of Applied Mathematics, Brown University, pp. 1-45, 1985.
D. W. Hosmer, Jr., and S. Lemeshow, Applied Logistic Regression, A Wiley-Interscience Publication, John Wiley & Sons, p. 6, 1989.
B. Osborne, "The Identification and Estimation of Parameters in Patter Theoretical Models," IBM Technical Report (TR 00.3608), IBM Poughkeepsie, N.Y., pp. 1-25, Mar. 1991.
R. W. B. Pearse and A. G. Gaydon, The Identification of Molecular Spectra, Fourth Edition, Imperial College, London, Chapman and Hall, pp. 217-219, 1976.
A. R. Striganov and N. S. Sventitskii, Tables of Spectral Lines of Neutral and Ionized Atoms, Atomic Spectroscopy Laboratory, I. V. Kurchatov Institute of Atomic Energy (Translated from Russian), IFI/Plenum, New York-Washington, pp. ix, x, 141-144 and 328, 1968.
G. G. Gifford, "Applications of optical emission spectroscopy in plasma manufacturing systems," SPIE vol. 1392 Advanced Techniques for Integrated Circuit Processing, pp. 454-465, 1990.
K. Fukunaga, Introduction to Statistical Pattern Recognition, Second Edition, Academic Press, Inc., pp. 51-59, 1990.
R. O. Duda and P. E. Hart, Pattern Classification and Scene Analysis, John Wiley & Sons, Inc., Chapter 2, pp. 10-22, 1973.
"OMA Vision ODA, Process Vision, Spectra Vision, ColorVision, Spectroscopy Software," brochure, EG&G Princeton Applied Research (1990), SC Technology Inc., 2-9.
"PCM Plasma Chemistry Monitor," brochure, SC Technology, Inc. (1990).

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