Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2007-04-10
2007-04-10
Nguyen, Cuong (Department: 2811)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C034S069000
Reexamination Certificate
active
11439965
ABSTRACT:
Methods and structures to reduce optical crosstalk in solid state imager arrays. Sections of pixel material layers that previously would have been etched away and disposed of as waste during fabrication are left as conserved sections. These conserved sections are used to amend the properties and performance of the imager array. In the resulting structure, the conserved sections absorb incident light. The patterned portions of conserved material provide additional light shielding for array pixels.
REFERENCES:
patent: 6333205 (2001-12-01), Rhodes
patent: 6611013 (2003-08-01), Rhodes
patent: 6803614 (2004-10-01), Takahashi
Dickstein & Shapiro LLP
Micro)n Technology, Inc.
Nguyen Cuong
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