Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Bipolar transistor
Reexamination Certificate
2007-11-20
2007-11-20
Tran, Minh-Loan (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Heterojunction device
Bipolar transistor
C257S198000, C257SE21372, C257SE29188, C438S310000, C438S312000
Reexamination Certificate
active
10997534
ABSTRACT:
According to one exemplary embodiment, a heterojunction bipolar transistor includes a base situated on a substrate. The heterojunction bipolar transistor can be an NPN silicon-germanium heterojunction bipolar transistor, for example. The heterojunction bipolar transistor further includes a cap layer situated on the base, where the cap layer includes a barrier region. The barrier region can comprises carbon and has a thickness, where the thickness of the barrier region determines a depth of an emitter-junction of the heterojunction bipolar transistor. An increase in the thickness of the barrier region can cause a decrease in the depth of the emitter-base junction. According to this exemplary embodiment, the heterojunction bipolar transistor further includes an emitter situated over the cap layer, where the emitter comprises an emitter dopant, which can be phosphorus. A diffusion retardant in the barrier region of the cap layer impedes diffusion of the emitter dopant.
REFERENCES:
patent: 5164797 (1992-11-01), Thornton
patent: 6437376 (2002-08-01), Ozkan
patent: 6593640 (2003-07-01), Kalnitsky et al.
patent: 2003/0080394 (2003-05-01), Babcock et al.
Farjami & Farjami LLP
Newport Fab LLC
Tran Minh-Loan
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