Method and structure for facilitating etching

Details Method and structure for facilitating etching Method and structure for facilitating etching

2007-11-06

2007-11-06

Deo, Duy-Vu N (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S707000, C438S714000

Reexamination Certificate

active

11414411

ABSTRACT:
A method and system for facilitating etching. Specifically, the method includes incorporating a fluorescent marker in a layer of a grouping of patterned layers. Etching of the group of patterned layers is controlled based upon the fluorescent marker.

REFERENCES:
patent: 6258497 (2001-07-01), Kropp et al.
patent: 6642090 (2003-11-01), Fried et al.
patent: 2002/0149109 (2002-10-01), Watanabe
patent: 2006/0003540 (2006-01-01), Van Haren et al.

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