Method and structure for fabricating patterns on phase shift...

Details Method and structure for fabricating patterns on phase shift... Method and structure for fabricating patterns on phase shift...

2006-04-25

2006-04-25

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000

Reexamination Certificate

active

07033709

ABSTRACT:
A reticle structure for integrated circuit device. The structure includes a transparent substrate having a surface region and a plurality of spaced regions on the surface region. Each of the spaced regions is configured to form an array, which has a plurality of rows that intersect a plurality of columns. Each of the spaced regions is defined within a pair of rows and a pair of columns; whereupon each of the spaced regions being separated by each other by a common dimension of no greater than 0.25 microns. At least one of the spaced regions includes a code to define a masked read only memory (ROM) structure. The one coded spaced region causes an interference with a light source to transmit a lower intensity of light relative to any one of the spaced regions free from the coding.

REFERENCES:
patent: 6139992 (2000-10-01), Chen et al.
patent: 6821684 (2004-11-01), Yang et al.

Affiliated with

Also associated with

Rating

Method and structure for fabricating patterns on phase shift... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and structure for fabricating patterns on phase shift..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and structure for fabricating patterns on phase shift... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3558827