Method and software for conducting efficient lithography WPH...

Details Method and software for conducting efficient lithography WPH... Method and software for conducting efficient lithography WPH...

2006-09-15

2009-02-10

Bahta, Kidest (Department: 2123)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C414S804000

Reexamination Certificate

active

07489982

ABSTRACT:
A method and a computer readable medium includes instructions for obtaining time data as programmed into processing recipes or as recorded when a wafer is processed and transferred during lithography operations. The data is parsed and saved into an MES database. A report server accesses the database responsive to a query made of the database. A query may specify one or more fabrication parameters. The specified fabrication parameter or parameters is fixed and a data display is provided that compares times for processing and transferring wafers in various lithography operations used in the production of the semiconductor device and bottlenecks in lithography operations are identified by the comparative data.

REFERENCES:
patent: 7054702 (2006-05-01), Barto et al.
patent: 2004/0091349 (2004-05-01), Tabrizi et al.
patent: 2004/0107014 (2004-06-01), Park
patent: 2005/0256600 (2005-11-01), Nakasugi

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