Method and semiconductor structure for monitoring the...

Details Method and semiconductor structure for monitoring the... Method and semiconductor structure for monitoring the...

2006-05-23

2009-02-17

Mulpuri, Savitri (Department: 2812)

Semiconductor device manufacturing: process

With measuring or testing

C438S018000

Reexamination Certificate

active

07491555

ABSTRACT:
By measuring an electric characteristic of a test pad that is connected to a plurality of test vias formed in accordance with a specified process flow for forming contacts and vias of a semiconductor device, one or more process specific parameters may quantitatively be estimated. Thus, a fast and precise measurement method for contacts and vias is provided in a non-destructive manner.

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patent: 2006/0246718 (2006-11-01), Frohberg et al.
patent: WO 03/067653 (2003-08-01), None

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