Method and related operation system for immersion lithography

Details Method and related operation system for immersion lithography Method and related operation system for immersion lithography

2006-03-14

2009-12-15

Lee, Diane I (Department: 2851)

Photocopying

Projection printing and copying cameras

Methods

C355S053000, C700S121000

Reexamination Certificate

active

07633601

ABSTRACT:
To avoid the yield of wafers that undergo immersion lithography influencing by delay of post exposure baking (PEB), an operation system adjusts a speed of inputting the wafers to undergo immersion lithography according to a status of wafers that have finished exposure and are waiting for baking. Therefore, the wafers that have finished exposure are transmitted to be baked efficiently and on time.

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patent: P2005-197469 (2005-07-01), None

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