Method and mask design to minimize reflective notching effects

Details Method and mask design to minimize reflective notching effects Method and mask design to minimize reflective notching effects

1996-10-17

1998-07-14

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Plural exposure steps

430396, 430322, 430494, 25049222, G03C 500

Patent

active

057802084

ABSTRACT:
A method is described for reducing light scatter in lithographically producing a resist feature wherein the dosage of light beyond the immediate periphery of the desired feature is subjected to a lower dosage of light than is required to properly define the edges of the resist feature. In addition, a mask is described which is partially opaque in those areas remote from the area delineating the desired feature.

REFERENCES:
patent: 4504558 (1985-03-01), Bohlen etal.
patent: 4520269 (1985-05-01), Jones
patent: 5086398 (1992-02-01), Moriizumi
patent: 5097138 (1992-03-01), Wakabayashi et al.
patent: 5424173 (1995-06-01), Wakabayashi et al.
patent: 5503951 (1996-04-01), Flanders et al.
patent: 5532496 (1996-07-01), Gaston
Proceedings, SPIE-The International Society for Optical Engineering, Optical/Laser Microlithography VII, 2-4 Mar. 1994, San Jose, CA, vol. 2197, pp. 140-149.
Proceedings, SPIE-The International Society for Optical Engineering, Optical/Laser Microlithography VIII, 22-24 Feb. 1995, Santa Clara, CA, vol. 2440, pp. 494-505.

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