Method and layout for high density reticle

Details Method and layout for high density reticle Method and layout for high density reticle

2005-01-18

2005-01-18

Mohamedulla, Saleha R. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S396000

Reexamination Certificate

active

06844118

ABSTRACT:
A method for making a reticle for use in a photolithography process is disclosed. The method includes forming at least two printable features and at least one sub-resolution connecting structure within the same layer of a reticle substrate, where the sub-resolution connecting structure connects at least two of the printable reticle features. The reticles themselves formed according to such methods as well as photolithographic processes using such a reticle are also disclosed. The reticle may be a binary mask, a phase shift mask, or an attenuated phase shift mask.

REFERENCES:
patent: 5707765 (1998-01-01), Chen
patent: 5725973 (1998-03-01), Han et al.
patent: 5795682 (1998-08-01), Garza
patent: 5801954 (1998-09-01), Le et al.
patent: 5821014 (1998-10-01), Chen et al.
patent: 5840447 (1998-11-01), Peng
patent: 6465138 (2002-10-01), Stanton

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