Method and its apparatus for detecting defects

Details Method and its apparatus for detecting defects Method and its apparatus for detecting defects

2007-04-03

2010-11-16

Chowdhury, Tarifur (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237300, C356S073000

Reexamination Certificate

active

07834992

ABSTRACT:
In the present invention, to make corrective matching thereof, it is designed as follows; position effect of defects coordinates, which are output from an inspection apparatus, is allowed, coordinates of inspected data are mutually corrected, and a state of coincidence or non-coincidence among a plurality sets of inspected data is output or displayed. Inspection data is designed to include kinds, kinds difference and dimension of defects. A state of coincidence or non-coincidence between inspected data is designed to be output or displayed appropriately, by kinds or dimensions, or by a grouping thereof, of a defects object. The same sample is inspected by every time of passing a production step, and a state of data increase or decrease, or coincidence or non-coincidence between the inspected data is designed to be output or displayed.

REFERENCES:
patent: 6028664 (2000-02-01), Cheng et al.
patent: 6320655 (2001-11-01), Matsushita et al.
patent: 2005/0094136 (2005-05-01), Xu et al.
patent: 2000-057501 (2000-02-01), None
patent: 2004-170092 (2004-06-01), None
S. Kaneko, et al., “Robust ICP Registration Algorithm Extended by M-estimation”, The japan Society of Precision Engineering, vol. 67, No. 8, pp. 1-5, 2001.

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