Chemical apparatus and process disinfecting – deodorizing – preser – Analyzer – structured indicator – or manipulative laboratory... – Automatic analytical monitor and control of industrial process
Reexamination Certificate
2007-05-22
2007-05-22
Soderquist, Arlen (Department: 1743)
Chemical apparatus and process disinfecting, deodorizing, preser
Analyzer, structured indicator, or manipulative laboratory...
Automatic analytical monitor and control of industrial process
C250S281000, C250S282000, C250S287000, C422S068100, C422S081000, C436S043000, C436S050000, C436S056000, C436S073000, C436S079000, C436S080000, C436S081000, C436S082000, C436S083000, C436S084000, C436S173000, C436S174000, C436S179000, C436S181000, C436S182000
Reexamination Certificate
active
10086025
ABSTRACT:
An analytical apparatus to monitor fluid systems has at least one extraction module having a raw-sample reservoir connected by input fluid conduit to individual ones of said fluid systems, to extract raw samples for analysis from said fluid systems, one or more modification modules comprising additive materials to modify the extracted raw samples prior to analysis, an analytical device to receive at least a portion of said raw samples in an ordered sequence, and to determine concentration of at least one constituent of said sample portion, fluid-handling apparatus for transferring fluid through the analytical apparatus, and a computerized control and management system to manage operations of component modules and devices, and to report analytical results. The apparatus is characterized in that the control and management system coordinates extraction of raw samples, modification as needed, introduction of fluids to the analytical device, and reporting of analytical results on a continuous basis over plural cycles.
REFERENCES:
patent: 4132605 (1979-01-01), Tench et al.
patent: 4324621 (1982-04-01), Kerby
patent: 4479852 (1984-10-01), Bindra et al.
patent: 4713772 (1987-12-01), Carlson
patent: 4917777 (1990-04-01), Fisher
patent: 4975328 (1990-12-01), Hirose et al.
patent: 5012052 (1991-04-01), Hayes
patent: 5054309 (1991-10-01), Mettes et al.
patent: 5182131 (1993-01-01), Hashimoto et al.
patent: 5192403 (1993-03-01), Chang et al.
patent: 5235186 (1993-08-01), Robins
patent: 5414259 (1995-05-01), Kingston
patent: 5572024 (1996-11-01), Gray et al.
patent: 5696378 (1997-12-01), Busch et al.
patent: 5703360 (1997-12-01), Fischer et al.
patent: 5777214 (1998-07-01), Thompson et al.
patent: 5872357 (1999-02-01), Flanagan
patent: 5892458 (1999-04-01), Anderer et al.
patent: 5983734 (1999-11-01), Mathur et al.
patent: 6032513 (2000-03-01), Chorush et al.
patent: 6280602 (2001-08-01), Robertson
patent: 6730517 (2004-05-01), Koster et al.
patent: 2273561 (1994-06-01), None
patent: 2294761 (1996-05-01), None
patent: 61-13153 (1986-01-01), None
patent: 11-6788 (1999-01-01), None
patent: 131310 (2000-05-01), None
patent: 99/39198 (1999-08-01), None
patent: 99/48602 (1999-09-01), None
Marchante-Gayon, J. M. et al, Special Publication—Royal Society of Chemistry 1997, 202, 85-94.
Wiederin, D. R. et al, Analytical Chemistyr 1991, 63, 1626-1631.
Seubert, A. Fresenius J. Anal. Chem. 1999, 364, 404-409.
Dahmen, J. et al, Fresenius J. Anal. Chem. 1997, 359, 410-413.
Beauchemin, D. et al, Analytical Chemistry 1997, 69, 3183-3187.
Bartels, H. et al, GIT Fachz. Lab. 1977, 21, 1276-1278 and 1280-1282.
Slobodnik J. et al, Journal of Chromatography A 1996, 730, 353-371.
Huang, C.-C. et al, Analytical Chemistry 1997, 69, 3930-3939.
Multala, R. et al, Kemia-Kemi 1977, 4, 627-631.
Stieg, S. et al, Analytical Chemistry 1980, 52, 796-800.
Israel, Y. et al, Analyst, 1989, 114, 1259-1265.
Lasztity, A. et al, Journal of Analytical Atomic Spectrometry 1989, 4, 761-766.
Maxwell, S. L., III et al, Chemical Abstracts, 1990, 115, abstract 125715.
Klinkenberg, H. et al, Spectrochimica Acta, 1993, 48B, 649-661.
Goossens, J. et al, Analytica Chimica Acta 1994, 293, 171-181.
Heumann, K. G. et al, Journal of Analytical Atomic Spectrometry 1994, 9, 1351-1355.
Hegy, G. et al, Chemical Abstracts 1996, 126, abstract 220107.
Albertus, F. et al, Analyst, 1999, 124, 1373-1381.
Dobney, A. et al, Analytica Chimica Acta 2000, 420, 89-94.
Maxwell, S. L., III et al, Nuclear Materials Management 1990, 19, 199-202.
Dohi, K. et al, R&D, Research and Development (Kobe Steel Ltd.) 1991, 41, 146-147.
Agudo, M. et al, Analytica Chimica Acta 1992, 264, 265-273.
Park, C. J. et al, Analytical Science & Technology 1995, 8, 427-434.
Waygood, J. B., Proceedings of the Chemists' Conference 1995, 47th, 64-68.
Ketterer, M. E. et al, Analytical Chemistry 1996, 68, 883-887.
Jinghong, H. et al, Sensors and Actuators B 1996, 35-36, 422-426.
Stewart, I. I. et al, Journal of Analytical Atomic Spectrometry 1996, 11, 1203-1214.
Olesik, J. W. et al, Journal of Analytical Atomic Spectrometry 1997, 12, 507-515.
Zoorob, G. et al, Journal of Analytical Atomic Spectrometry 1997, 12, 517-524.
Baron, D. et al, Journal of Environmental Quality 1998, 27, 844-850.
Raffaelli, A. et al, Inorganica Chimica Acta 1998, 275-276, 462-469.
May, T. W. et al, Atomic Spectroscopy 1998, 19, 143-149.
Ross, A. R. S. et al, Analytical Chemistry 1998, 70, 2225-2235.
Schramel, O. et al, ournal of Chromatography, A 1998, 819, 231-242.
Godec, R. et al, Semiconductor Pure Water and Chemicals Conference 1999, 18th, 91-110.
Szpunar, J. et al, Chemia Analityczna (Warsaw) 1999, 44, 351-362.
Henderson, W. et al, Inorganica Chimica Acta 1999, 294, 183-192.
Mollah, S. et al, Analytical Chemistry 2000, 72, 985-991.
Whistler, W. J. et al, International Journal of Mass Spectrometry and Ion Physics 1983, 46, 159-162.
Shushan, B. et al, ACS Symposium Series 1986, 295, 284-293.
Renn, C. N. et al, Analytical Chemistry 1989, 61, 1915-1921.
Lindberg, C. et al, Journal of Chromatography 1991, 554, 215-226.
Lindberg, C. et al, Biological Mass Spectrometry 1992, 21, 525-533.
Grundig, B. et al, Journal of Biotechnology 1993, 31, 277-287.
Champion, B. R., Publications of the Australasian Institute of Mining and Metallurgy 1993, Jul. 1993, 257-265.
Welz, B. et al, Pure and Applied Chemistry 1993, 65, 2465-2472.
Lee, M.-K. et al, Journal of the Chinese Chemical Society 1994, 41, 711-717.
Einarsson, O. et al, Journal of Automatic Chemistry 1995, 17, 21-24.
Agudo, M. et al, Analytica Chimica Acta 1995, 308, 77-84.
Frary, B. D., Analyst 1998, 123), 233-237.
Zerihun, A. et al, LC-GC 1999, 17, 862, 864.
Fassett et al.,Determination of Nanogram Quantities of Vanadium in Biological Material by Isotope Dilution Thermal Ionization Mass Spectrometry with Ion Counting Detection, Anal. Chem. (Nov. 1985), pp. 2474-2478, V57, No. 13.
Fassett et al.,Isotope Dilution Mass Spectrometry for Accurate Elemental Analysis, Anal. Chem. (May 15, 1989), pp. 643A-649A V61, No. 10.
Viczian et al.,On-line Isotope Dilution and Sample Dilution by Flow Injection and Inductively Coupled Plasma Mass Spectrometry, J. Anal. Atom. Spectro. (Apr. 1990), pp. 125-133, V5.
Rottmann et al.,Determination of Heavy Metal Interactions with Dissolved Organic Materials in Natural Aquatic Systems by Coupling a High-Performance Liquid Chromatography System with an Inductively Coupled Plasma Mass Spectrometer, Anal. Chem. (Nov. 1, 1994), pp. 3709-3715, V66.
Heumann et al.,Elemental Speciation with Liquid Chromatography-Inductively Coupled Plasma Isotope Dilution Mass Spectrometry, J. Anal. Atom. Spectro. (Dec. 1994), pp. 1351-1355 V9.
Horn et al.,Comparison of heavy metal analyses in hydrofluoric acid used in microelectronic industry by ICP-MS and thermal ionization isotope dilution masss spectrometry, Fresenius J. Anal. Chem (1994), pp. 286-292, V350.
Rottman et al.,Development of an on-line isotope dilution technique with HPLC/ICP-MS for the accurate determination of elemental species, Fresenius J. Anal Chem. (1994), pp. 221-227, V350.
Cole,Electrospray Ionization Mass Spectrometry: Fundamentals, Instrumentation and Applications, John Wiley & Sons, Inc. (1997), New York.
Stewart,Electrospray mass spectrometry: a tool for elemental speciation, Spectrochimica, Acta. (1999), pp. 1649-1695, Part-B, vol. 54.
International Technology Roadmap for Semiconductors 1999 Edition: Defect Reduction, Sematech, Austin, TX, pp. 269-293.
Newton et al.,Analysis of Copper Plating Baths—Suppressors and Levelers, Electrochemical Society Proceedings, pp. 1-5, V2000-27.
Anderson Marc R.
Kingston Howard M.
Stewart Larry N.
Hallman Jonathan W.
MacPherson Kwok & Chen & Heid LLP
Metara, Inc.
Soderquist Arlen
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