Method and imaging apparatus for imaging a structure onto a...

Details Method and imaging apparatus for imaging a structure onto a... Method and imaging apparatus for imaging a structure onto a...

2007-05-29

2007-05-29

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S030000, C355S053000, C378S034000, C378S035000, C250S492100, C250S492200

Reexamination Certificate

active

10986288

ABSTRACT:
The hydrodynamic effects—which occur during immersion lithography as a result of the movement of the semiconductor wafer—in a liquid preferably provided between the last lens surface of the projection system and the semiconductor wafer can be avoided by means of a movable illumination region for illuminating a cutout of a mask containing a structure to that can be imaged onto the semiconductor wafer. A scan movement of the mask and the semiconductor wafer can be either reduced or entirely avoided by means of a movement of the illumination region.

REFERENCES:
patent: 5673134 (1997-09-01), Oka et al.
patent: 2002/0045109 (2002-04-01), Yamada
patent: 2002/0072194 (2002-06-01), Nakao et al.
patent: 2006/0077370 (2006-04-01), Mulkens et al.
patent: 10-303114 (1998-11-01), None

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