Method and handling apparatus for placing patterning device...

Details Method and handling apparatus for placing patterning device... Method and handling apparatus for placing patterning device...

2011-01-11

2011-01-11

Berman, Jack I (Department: 2881)

Radiant energy

Means to align or position an object relative to a source or...

C250S306000, C250S307000, C250S310000, C250S311000, C250S442110

Reexamination Certificate

active

07868303

ABSTRACT:
A patterning device handling apparatus for use in charged particle beam imaging is disclosed. The disclosed patterning device handling apparatus comprises a first gripping member and a second gripping member. The first gripping member is equipped with a plurality of first positioning projections, and the second gripping member is equipped with a plurality of second positioning projections. When the patterning device is held at one angle, the first positioning projections abut against one edge of the patterning device and the second positioning projections abut against the opposite edge of the patterning device. When the patterning device is held at another angle, the first positioning projections abut against two neighboring edges of the patterning device, and the second positioning projections abut against the other two neighboring edges of the patterning device. Therefore, the disclosed patterning device handling apparatus can hold the pattering device at different angles.

REFERENCES:
patent: 2010/0102226 (2010-04-01), Huang et al.
patent: 2010/0165346 (2010-07-01), Wang et al.

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