Method and device to monitor nitrogen gas purity during the manu

Details Method and device to monitor nitrogen gas purity during the manu Method and device to monitor nitrogen gas purity during the manu

1997-05-22

1999-01-05

Spitzer, Robert

Gas separation: processes

With control responsive to sensed condition

Gas flow rate sensed

95 54, 96 4, 96422, B01D 5322

Patent

active

058556460

ABSTRACT:
A method and device indirectly monitors the purity of nitrogen gas manufactured from air using a permeable membrane to separate air components. A gas flow measuring device inserted in gas conduits downstream from the membrane monitors nitrogen gas purity by measuring normal flow and detects deviation from desired purity levels by changing gas flow caused by manufacturing apparatus malfunctions.

REFERENCES:
patent: 3241293 (1966-03-01), Pfefferle
patent: 3295359 (1967-01-01), Peck
patent: 3604246 (1971-09-01), Toren
patent: 3715866 (1973-02-01), Chatlos et al.
patent: 3930813 (1976-01-01), Gessner
patent: 3930814 (1976-01-01), Gessner
patent: 4422859 (1983-12-01), McGee
patent: 4586389 (1986-05-01), Vincent et al.
patent: 4648888 (1987-03-01), Rowland
patent: 4806132 (1989-02-01), Campbell
patent: 4857082 (1989-08-01), DiMartino, Sr. et al.
patent: 5053058 (1991-10-01), Mitariten
patent: 5266101 (1993-11-01), Barbe et al.
patent: 5281253 (1994-01-01), Thompson
patent: 5302189 (1994-04-01), Barbe et al.
patent: 5308382 (1994-05-01), Prasad
patent: 5388413 (1995-02-01), Major et al.
patent: 5439507 (1995-08-01), Barbe et al.
patent: 5470379 (1995-11-01), Garrett
patent: 5496388 (1996-03-01), Tellier
patent: 5507855 (1996-04-01), Barry
patent: 5588984 (1996-12-01), Verini
patent: 5649995 (1997-07-01), Gast, Jr.
patent: 5688306 (1997-11-01), Verini

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